Application of Plasma Chemical Vaporization Machining for Figuring of Reaction-sintered Silicon CarbideCeramic,Machining,Silicon,Ultra-precision David Billington2018-08-17T13:37:51+00:00 Read More
Planarization of SiC and oxide surfaces by using Catalyst-Referred Etching with water euspen2018-04-04T13:57:18+00:00 Read More
Removal of subsurface damage of 4H-SiC wafer by plasma assisted polishing euspen2018-04-04T13:57:33+00:00 Read More
Study on oxidation processes of 4H-SiC (0001) for investigation of the atomically flattening mechanism in plasma assisted polishing euspen2018-04-04T13:58:55+00:00 Read More
Polishing pad properties for achieving high edge surface flatness euspen2018-04-04T13:59:02+00:00 Read More
A novel abrasive-free chemical planarization of oxide materials using pure water and Pt catalyst euspen2018-04-04T13:59:42+00:00 Read More
Novel cutting tools having micro textured surface for steel cutting euspen2018-04-04T13:59:42+00:00 Read More
Polishing characteristics of single crystal SiC assisted by plasma oxidation using different kinds of abrasives euspen2018-04-04T14:00:08+00:00 Read More
Flatness correction of quartz glass substrate by plasma jet figuring with pulse width modulation control euspen2018-04-04T14:00:12+00:00 Read More
A new mirror-like finish method for oxide materials by a catalytically induced chemical etching in pure water euspen2018-04-04T14:02:49+00:00 Read More
