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Osaka university
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Osaka university
Polishing characteristics of CVD-SiC in plasma-assisted polishing
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euspen
2018-04-04T14:02:50+00:00
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Flattening of single crystal SiC by combination of anodic oxidation and soft abrasive polishing
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euspen
2018-04-04T14:02:51+00:00
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Stacking mirror device using millimeter-thick elliptical supermirrors fabricated by numerically controlled local wet etching for focusing neutron beam
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euspen
2018-04-04T14:03:52+00:00
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Analysis of subsurface atomic structure of 4H-SiC processed by plasma assisted polishing
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euspen
2018-04-04T14:03:57+00:00
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Microgrooving with Flat-ends for Hard Materials
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euspen
2018-04-04T14:04:28+00:00
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Scanning measurement of step height and freeform surface by using optically trapped microsphere
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euspen
2018-04-04T14:05:17+00:00
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DNA Autonomous Joint for Micro Self-assembly
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euspen
2018-04-04T14:06:02+00:00
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High-integrity Finishing of Reaction Sintered SiC by Plasma Assisted Polishing Using Ceria Abrasive
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euspen
2018-04-04T14:06:04+00:00
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Electrochemical mechanical polishing of difficult-to-machine mold materials
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euspen
2018-04-04T14:06:53+00:00
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Highly-efficient slurryless finishing of GaN by plasma-assisted polishing using a resin bonded grinding stone
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euspen
2018-04-04T14:06:54+00:00
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