Osaka university

|Osaka university

Highly-efficient plasma-assisted polishing technique with auto-dressing

Dressing,Manufacturing,Polishing

Preparation of highly planarized optical surface on Si substrate via catalyst-referred etching

Etching,Polishing

Three-dimensional nano-profile of convex cylindrical mirror measured by normal vector tracing method

Measurement,Optical,Profile,Surface

Measurements of freeform surfaces with three dimensional nano-profiler based on normal vector tracing method

Measurement,Profile,Surface,Uncertainty

Feasibility using ethanol-added argon instead of helium as the carrier gas used in atmospheric-pressure plasma chemical vaporization machining

Atomically smooth Si surface planarized using a thin film catalyst in pure water

Etching,Polishing,Processing,X-ray

High-efficiency SiC polishing using a thin film catalyst in pure water

Etching,Machining,Polishing,Simulation

Laser micro machining using a photonic nanojet controlled by incident wavelength

Laser micro machining

High-efficiency planarization of SiC in pure water using a thin film catalyst

Bonding,Etching,Machining,Polishing

Development of high efficiency polishing method using pure water and Ni catalyst

Nickel,Polishing

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