Uploaded: 12th June 2020
AuthorSun Rongyan, Keiichiro Watanabe, Shiro Miyazaki, Toru Fukano, Masanobu Kitada, Kentaro Kawai, Kenta Arima, Kazuya Yamamura Download FileFeasibility using ethanol-added argon instead of helium as the carrier gas used in atmospheric-pressure plasma chemical vaporization machining
Home|Feasibility using ethanol-added argon instead of helium as the carrier gas used in atmospheric-pressure plasma chemical vaporization machining