Progress in nanometrology: reduction of measurement uncertainty of step height and etching depth calibration down to 0.3 nm
Accuracy,Atomic force microscopy (AFM),Metrology,Nano technology
Accuracy,Atomic force microscopy (AFM),Metrology,Nano technology
Computer aided design (CAD),Development,Measuring instrument
Computer aided design (CAD),Interferometry,Measuring instrument,Metrology
Design,Microstructure,Sensor,Ultra-precision
Dimensional,Microscope,Microstructure,Modelling
Analysis,Finite element method (FEM),Metrology,Vibration
Analysis,Measuring instrument,Metrology,X-ray
Analysis,Dimensional,Metrology,Microscope
Design,Measurement,Turning,Ultra-precision