Tutorials
29th May – 2nd June 2017, Hannover Congress Centre, Hannover, Germany
euspen’s 2017 tutorial programme will cover a range of key topics for the precision engineer and nanotechnologist.
Whilst covering a clear technical curriculum, tutorials are less formal than a lecture; providing more personalised learning in a social atmosphere.
They incorporate existing challenges in the workplace which cover conceptual theories through to best practice applications.
These tutorials will take place on Monday 29th May 2017.
Fundamentals of Precision Design
Hannover Congress Centre, Hannover, Germany
Monday 29 May 2017
Time: 09:30 – 12:30
euspen’s 2017 tutorial programme will cover a range of key topics for the precision engineer and nanotechnologist.
This lecture provides a fast paced hands-on introduction to rapid precision machine design based on FUNdaMENTAL principles, including theory and best practices.
Topics include: design philosophy, principles of accuracy, repeatability and resolution, error budgeting, bearings, structures, and actuators.
Examples will be presented to show why understand FUNdaMENTAL principles is critically important for a designer to understand in order to be able to most effectively use modern design tools such as solid modeling and finite element analysis in the design of precision machines.
Attendees are encouraged to bring pencils and paper to learn by solving real problems as part of the lecture.
This tutorial is aimed at applied practitioners of precision machine design who want a different perspective based on the philosophy of the mathematics and physics of precision. Real-world hands on “tricks” and the philosophy and math behind them to optimize.
The tutor is Prof. Alex Slocum from MIT, US
Optical Measurement Technology
Hannover Congress Centre, Hannover, Germany
Monday 29 May 2017
Time 09:30 – 14:30
This tutorial presents fundamentals, principles and practical examples of modern optical measurement technologies.
It starts with selected basics in geometrical and wave optics. Furthermore, relevant information about the processing of image-like data is given.
Because the scope of optical measurement principles is widely diversified, the content is focused on those techniques which are relevant for the solution of measurement tasks in surface feature measurement (shape, waviness, roughness, and isolated defects), experimental stress analysis, nondestructive testing and high resolution reconstruction of non-resolved features in nanometrology.
Principles for the solution of inverse/reconstruction/identification problems in optical metrology are presented. The tutorial ends with a discussion of current challenges for optical inspection principles and tries to give advice for their completion.
Tutorial outcomes
After the completion of training the participants have an overview about the current state of the art in optical measurement principles and are able to understand the advantages and disadvantages of the technology. Moreover, they are informed of the current challenges that the technology has confronted with.
Participant profile
This tutorial is designed for anyone who is interested in modern principles and technologies of optical metrology and inspection. The presentation contains some basic principles of geometrical and wave optics, and image processing as well, but is focused on their application for the implementation of optical measurement techniques for practical use.
The tutor is Prof. Wolfgang Osten from University of Stuttgart, DE
Dynamics & Control of Mechatronic Systems
Hannover Congress Centre, Hannover, Germany
Monday 29 May 2017
Time 09:30 – 16:00
Dynamics & Control of Mechatronic Systems
Over a period of more than 40 years Dutch companies as Philips Electronics, ASML, FEI, OCE and many others have developed a successful approach to the Design and Development of Mechatronic solutions for High Precision Motion. Starting with consumer products as Optical Disc Drives and leading to advanced solutions for nanometer positioning in combination with accelerations of more than 10g’s used in the Lithography tools, a continuous attention to development of new industrial technology delivered successful results.
This tutorial will focus on an integrated approach of machine dynamics & control and the tutors will present lessons learned in industrial practice but also developments in advanced control and machine design that are promising for further technological improvements and which should help to ‘push the limits …. but also push back’.
Included in the Tutorial Fee is a copy of the book “The Design of High Performance Mechatronics” by R. Munnig Schmidt, G. Schitter, A. Rankers and J. van Eijk.
Tutors
Dr. Dick Laro (1978) received the M.Sc. and Ph.D. degree in Mechanical Engineering from the Delft University of Technology in the period 1997-2007. During his Ph.D., he worked on the development of magnetically levitated positioning systems. From 2007-2008 he worked as mechatronic developer at Singulus Mastering. In 2009 he joined MI-Partners in Eindhoven, were he currently holds the position of Mechatronic Architect and is competence leader for the dynamics and control group. Here he has worked on the development of various mechatronic systems in the semiconductor industry. He has been involved in various international training activities.
Tim Groothuijsen (1983) received the M.Sc. degree in Mechanical Engineering from the Eindhoven University of Technology in 2011. The focus of his work has been on Control Systems Technology. As of 2011 he works at MI-Partners in Eindhoven as Mechatronic System Designer. He has been involved in various in-company training activities.
Dr. Adrian Rankers (1960) received the M.Sc. degree (cum laude) in Mechanical Engineering from Delft University of Technology in 1985. From 1985-1991 he worked as technologist Dynamics & Control and from 1991-1998 as groupleader with Philips Center For Technology (CFT). The main application area were optical disc drives and lithography equipment. In 1997 he received the PhD degree from the Twente University of Technology. In 1998 he joined Philips-Assembleon to work on SMD-component mounters in successive roles as chairman system group, manager sustaining and product team manager. In 2003 he returned to the Mechatronics department of Philips-CFT as manager Mechatronics Research and later Equipment & Motion Control. Since 2010 he works as an independent consultant and trainer in the field of Precision Mechatronics and he is the co-founder and managing partner of the Mechatronics Academy, which cooperates with The High Tech Institute in the field of advanced mechatronics training.
For more than 20 years he has been active in Mechatronics training at Philips but also in ASPE and euspen tutorials. Within euspen he is a member of the International Scientific Committee. In 2008 he also became board member of the Dutch Society for Precision Engineering (DSPE) and is organizer of the biennial DSPE-conference on precision mechatronics.
Introduction Design in Ultra High Vacuum
Hannover Congress Centre, Hannover, Germany
Monday 29 May 2017
Time 09:30 – 12:30
Design for and construction in a specific vacuum? The ideal vacuum would be an empty vacuum.
Design for and construction in a specific vacuum? The ideal vacuum would be an empty vacuum. Unfortunately an empty vacuum does not exist. Moreover, any introduction of additional functionality introduces a source of gasses and contamination. Designers in the “normal atmospheric world” may use their acquired instinct and experience, but may fail under ultra-clean vacuum conditions. The main reason being that basic rules of vacuum completely differ from those at atmospheric or higher pressures.
After the tutorial the trainees have been acquainted with the basics of vacuum technique. Subsequently they will learn how to make a robust design, applicable for vacuum conditions.
The trainees will acquire a basic knowledge how to create, measure and maintain vacuum. Vacuum has properties unknown in our daily surroundings i.e. there is no standard reference with daily life for people not involved in vacuum technique. To develop the required level of perception and understanding basic theoretical knowledge about vacuum systems will be combined with exercises during the course.
Intended for
The course “introduction Design in Ultra High Vacuum” is meant for employees of BSc and higher level responsible for constructions in ultra-clean vacuum in any way. These employees could be in Research and Development, Engineering, Purchase, Management etc.
Program
The tutorial focusses on the basics of vacuum fundamentals and guidelines for the design of vacuum compatible applications and vacuum systems. Outline of the program is as follows:
- Introduction, basic principles and properties of gases at low pressures
- Flow of gases, flow regimes
- System design for vacuum applications; budgeting of vacuum requirements
- Material properties and selection
- Vacuum forces and disturbances
- Vacuum seals
- Joining techniques
- Heat transfer in vacuum
- Electronics in vacuum
- Bearings in vacuum
- Application of lubricants in vacuum
- Actuators in vacuum
- Feedthroughs
- (Design for) qualification, Residual Gas Analysis (RGA)
Tutors
Gerrit van der Straaten (1977), BSc Mechanical Engineering
Industrial background:
2008 – present: Settels Savenije van Amelsvoort
Sr Technology Consultant – Architect. Expertise in the field of vacuum systems, EUV lithography systems, electron microscopes, deposition equipment
2001 – 2007: Philips Applied Technologies (Philips CFT)
Sr. Mechanical Designer – Design of equipment in the field of EUV lithography systems, Electron microscopes
2001 – 2002: Philips CFT
Designer; participant of the Masterclass for Mechatronic designer
2010 – present: tutor vacuum design principles at The High Tech Institute, Eindhoven
4 US patents and European Patents in the field of Extreme UV and health care systems
Tutors
Mark Meuwese (1961), BSc engineering
Industrial background:
2008 – present: Settels Savenije van Amelsvoort
CTO Settels Savenije van Amelsvoort
Group leader Research & Feasibility
System architect. Expertise in the field of vacuum systems, lithographic systems, electron microscopes, deposition equipment
2000 – 2008: Philips Applied Technologies
Principal designer
1986 – 2000: Philips Research
Mechanical designer
2005 – 2007: tutor vacuum design principles at Philips Centre for Technical Training (CTT)
2007 – present: tutor vacuum design principles at The High Tech Institute, Eindhoven
20+ US patents and European Patents in the field of electron microscopy, Extreme UV, MEMS, health care systems and deposition systems