Uploaded: 3rd June 2022
AuthorGaoliang Dai, Xiukun HuAccuracy,Atomic force microscopy (AFM),Metrology,Nano technology
Download FileProgress in nanometrology: reduction of measurement uncertainty of step height and etching depth calibration down to 0.3 nm
Home|Progress in nanometrology: reduction of measurement uncertainty of step height and etching depth calibration down to 0.3 nm